CVD (Chemical Vapor Deposition)

Silicon precursors for forming silicon, silicon dioxide, silicon nitride and silicon carbide thin film on microchips

Silanes play a special role in the complex world of microchip manufacturing, which requires more than 400 different chemicals. As a source of silicon, silicon dioxide, silicon nitride and silicon carbide, they form a large part of the actual chip material. Chemical vapor deposition (CVD) is the preferred technique in the semiconductor industry. It enables the uniform deposition of even the finest structures on wafers. The purity of the silanes used is of paramount importance, as impurities can affect the electrical properties and thus the performance of the devices.

Evonik meets the industry’s stringent purity requirements with its DYNASYLAN® and SIRIDION® silanes, which have a purity of up to 99.99999 percent. Special analysis methods ensure that the silanes are available in consistent quality.

To keep pace with advances in the semiconductor industry, Evonik is continuously researching innovative materials. The aim is to further improve the quality of high-purity silanes and to develop new precursors. In addition, Evonik’s experts assist customers worldwide in handling these special silanes and offer comprehensive technical support.

 

 

Siridion®

Dynasylan®

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