IDISIL® is the Evonik brand name for an ultra-high purity colloidal silica particle designed specifically for semiconductor fabrication.
In the production of microchips, thin layers are applied to wafers and must be polished. So-called CMP (chemical mechanical planarization) slurries are used for this purpose. These consist mainly of colloidal silica as abrasive.
High product consistency
IDISIL® sol-gel colloidal silica are characterized by their ultra-high purity and high product consistency. Evonik’s proprietary manufacturing process makes colloidal silica particles with unique abrasive properties.
These are monodisperse, available in different shapes and particle sizes, and with various optional surface functionalizations to suit any desired application. Thus, CMP slurry manufacturers can differentiate their CMP slurry formulations by using these high-quality abrasives. Also, Evonik is backward integrated into the highly pure raw material.
Local supply and technical support
With the opening of the first production site in Michigan USA, Evonik is the only Western producer of colloidal silica. Customers can rest assured that IDISIL® products comply with all US regulations and standards. Local supply and immediate technical support are also always guaranteed.
Evonik’s silane experts work closely with their customers to offer products that meet their needs. Together they develop tailor-made solutions with high performance. These are also particularly environmentally friendly, as Evonik pays special attention to using sustainable ingredients and reducing the carbon footprint in the production of IDISIL® colloidal silica.